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Fari Plasma Environmental Equipment & Supplies
5 equipment items found
Manufactured by:Fari Plasma based inShenzhen, CHINA
The GM-6000 DVG3 Plasma Treatment Machine is an advanced surface treatment device designed for low-temperature plasma applications. This model integrates a sophisticated communication function, ensuring seamless integration and control within industrial settings. It is engineered to enhance surface properties by effectively altering the chemical and physical attributes of materials. The machine ...
Manufactured by:Fari Plasma based inShenzhen, CHINA
The GD-125 Vacuum Plasma Cleaner is a high-performance equipment designed for the efficient treatment of various surfaces, including plastics, metals, and glass. This machine excels in activating surfaces such as PPS plastic for printing purposes, effectively preparing metal and glass surfaces through vacuum plasma cleaning, and ensuring PCBs are ready for bonding. This advanced unit helps ...
Manufactured by:Fari Plasma based inShenzhen, CHINA
The GD-10 Vacuum Plasma Cleaning Machine, developed by Fari, is engineered to efficiently handle a variety of cleaning applications across diverse industries. With its high versatility, it is suitable for handling products with various shapes. Specially crafted for the removal of surface oxides, organic pollutants on wafers, IC chips, and semiconductors, it plays a key role in the preparatory ...
Manufactured by:Fari Plasma based inShenzhen, CHINA
The PM-G16D Wide Plasma Treatment Machine is engineered for precision surface modifications, dealing with both metallic and plastic materials, and boasting a customizable processing width that extends up to 2000mm. Utilizing nitrogen gas as the process medium, it ensures a uniform treatment effect. Technically, the equipment operates on a power supply of AC220V at 50 Hz and is compact with ...
Manufactured by:Fari Plasma based inShenzhen, CHINA
The AF-G40 Plasma Treatment Machine combined with a Rotating Platform is designed for advanced surface treatment applications. Having been refined over 12 years of dedicated research and development, this system provides plasma cleaning and treatment solutions for a variety of materials, including round substrates. It is instrumental in preparing hardware components for subsequent processes such ...